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Comparison between SiNx:Hand hydrogen
passivation of electromagnetically casted
multicrystalline silicon material
E. Fourmonda,*, R. Bilyalovb, E. Van Kerschaverb, M. Lemitia,
J. Poortmansb, A. Laugiera
a Laboratoire de Physique de la Mati"ere, 7 av. J. Capelle, INSA, 69621 Villeurbanne cedex, France
bIMEC, Kapeldreef 75, B-3001 Leuven, Belgium
